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For the complete documentation index, see llms.txt. This page is also available as Markdown.

Liftoff

    1. Solvent Clean and N2 Dry

      1. Dehydration Bake

      2. Cool(room temp)

      3. Spin Coat 70uL of LOR

      4. Final Speed - 3000 rpm

      5. Accel/Decel - 300 rpm/s

      6. Total Time - 50s(i.e. Time at final speed = 30s)

      7. Bake 190C for 5 mins

      8. Cool(room temp)

      9. Spin Coat 70uL of S1813 PPR

      10. Final Speed - 4000 rpm

      11. Accel/Decel - 400 rpm/s

      12. Total Time - 50s(i.e. Time at final speed = 30s)

      13. Expose - big checkerboard pattern - 65s

      14. Develop in MF319 - 60s

      15. Sputter - 115W for 30 mins

      16. Remove resist - Acetone/PG remover at 100C for ~5 mins

i think this misses a pre exposure bake we generally do with PPR

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