2026-07-07 furnace ellipso

Objective

Measure the thickness of $SiO_2$ grown on a silicon sample (with native oxide) in our tube furnace at $1100^{\circ}\text{C}$

Process

1. Wafer: Si, 4-inch, p-type, 100
2. Cleave wafer into 2cm x 1cm samples
3. Preheat tube furnace to $1100^{\circ}\text{C}$
4. Place sample inside for t minutes, t ranging from 5 to 45 in increments of 5
5. Measure thermal oxide thickness using Woollam Ellipsometer @ IITNF

Plot

Data