2026-07-07 sputter profilo

Process

Aluminium sputter, power = 115W, duration = 5min, 15min, 30min

Samples

Sample 1: 5min, 115W. 38-47nm

comments: very dirty - black spots on both Si and deposited Al

Reading 1:

Scan length: 240um Step height: 47nm Profile:

Reading 2:

Scan length: 80um Step height: 38nm

Profile:

Sample 2: 15min, 115W.

Reading 1:

comments: sample was much cleaner visually

scan location:

scan length: 325um scan duration: 325s horizontal resolution according to software: 3nm/pt

step visible at 0.12mm, but no flat region on either side

after fitting two point linear:

TODO